semiconductor plasma

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• Semiconductor device fabrication — Semiconductor manufacturing processes 10 µm 1971 3 µm 1975 1.5 µm 1982 …   Wikipedia

• Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… …   Wikipedia

• Plasma stealth — is a proposed process that uses ionized gas (plasma) to reduce the radar cross section (RCS) of an aircraft. Interactions between electromagnetic radiation and ionized gas have been extensively studied for a variety of purposes, including the… …   Wikipedia

• Plasma oscillation — Plasma oscillations, also known as Langmuir waves (after Irving Langmuir), are rapid oscillations of the electron density in conducting media such as plasmas or metals. The frequency only depends weakly on the wavelength. The quasiparticle… …   Wikipedia

• Plasma cleaning — involves the removal of impurities and contaminants from surfaces through the use of an energetic plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used. Lower energy… …   Wikipedia

• Plasma-unterstütztes Ätzen — (physikalisch chemisches Ätzen) bezeichnet eine Gruppe von subtraktiven (abtragenden) Mikrostrukturverfahren in der Halbleitertechnologie. Als Trockenätzverfahren stellen sie alternative Strukturierungsverfahren zum sog. Nassätzen (nasschemischen …   Deutsch Wikipedia

• Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… …   Wikipedia

• Plasma etcher — A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. Plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine bearing gas, using a high frequency electric field, typically 13.56… …   Wikipedia

• Semiconductor — Citations missing|date=March 2008A semiconductor is a solid material that has electrical conductivity in between a conductor and an insulator; it can vary over that wide range either permanently or dynamically. [. They are used in many… …   Wikipedia

• Plasma (physics) — For other uses, see Plasma. Plasma lamp, illustrating some of the more complex phenomena of a plasma, including filamentation. The colors are a result of relaxation of electrons in excited states to lower energy states after they have recombined… …   Wikipedia

• Plasma display — A plasma display panel (PDP) is a type of flat panel display now commonly used for large TV displays (typically above 37 inch or 940 mm). Many tiny cells located between two panels of glass hold an inert mixture of noble gases. The gas in the… …   Wikipedia